ICC讯(Xun) 近(Jin)日(Ri),(?)在(Zai)第(Di)12届(Jie)中(Zhong)国(Guo)硬(Ying)科(Ke)技(Ji)产(Chan)业(Ye)链(Lian)创(Chuang)新(Xin)趋(Qu)势(Shi)峰(Feng)会(Hui)上(Shang),(?)清(Qing)纯(Chun)半(Ban)导(Dao)体(Ti)有(You)限(Xian)公(Gong)司(Si)市(Shi)场(Chang)经(Jing)理(Li)詹(Zhan)旭(Xu)标(Biao)发(Fa)表(Biao)《(?)车(Che)载(Zai)电(Dian)驱(Qu)&供(Gong)电(Dian)电(Dian)源(Yuan)用(Yong)SiC技(Ji)术(Shu)
最(Zui)新(Xin)发(Fa)展(Zhan)趋(Qu)势(Shi)》(?)报(Bao)告(Gao),(?)SiC((?)碳(Tan)化(Hua)硅(Gui))(?)被(Bei)公(Gong)认(Ren)是(Shi)提(Ti)升(Sheng)新(Xin)能(Neng)源(Yuan)汽(Qi)车(Che)续(Xu)航(Hang)里(Li)程(Cheng)的(De)最(Zui)佳(Jia)方(Fang)案(An),(?)伴(Ban)随(Sui)着(Zhuo)新(Xin)能(Neng)源(Yuan)汽(Qi)车(Che)销(Xiao)售(Shou)急(Ji)剧(Ju)增(Zeng)长(Chang),(?)SiC正(Zheng)在(Zai)迎(Ying)来(Lai)非(Fei)常(Chang)巨(Ju)大(Da)的(De)应(Ying)用(Yong)市(Shi)场(Chang),(?)并(Bing)给(Gei)予(Yu)了(Liao)国(Guo)产(Chan)化(Hua)SiC崛(Jue)起(Qi)的(De)机(Ji)会(Hui)窗(Chuang)口(Kou)。(?)
2023年(Nian)中(Zhong)国(Guo)新(Xin)能(Neng)源(Yuan)汽(Qi)车(Che)销(Xiao)售(Shou)达(Da)到(Dao)950万(Wan)辆(Liang),(?)市(Shi)场(Chang)占(Zhan)用(Yong)有(You)率(Lu)达(Da)到(Dao)31.6%,(?)预(Yu)计(Ji)2024年(Nian)新(Xin)能(Neng)源(Yuan)产(Chan)销(Xiao)量(Liang)将(Jiang)达(Da)1200-1300万(Wan)辆(Liang),(?)市(Shi)占(Zhan)率(Lu)超(Chao)过(Guo)45%并(Bing)占(Zhan)全(Quan)世(Shi)界(Jie)产(Chan)销(Xiao)售(Shou)60%。(?)在(Zai)这(Zhe)个(Ge)市(Shi)场(Chang)发(Fa)展(Zhan)过(Guo)程(Cheng)中(Zhong),(?)SiC上(Shang)车(Che)速(Su)度(Du)加(Jia)快(Kuai),(?)打(Da)造(Zao)国(Guo)产(Chan)SiC车(Che)型(Xing)合(He)计(Ji)142款(Kuan),(?)而(?)750V
及(Ji) 1200V SiC MOSFETs 是(Shi)主(Zhu)驱(Qu)应(Ying)用(Yong)的(De)主(Zhu)流(Liu)器(Qi)件(Jian),(?)而(?)器(Qi)件(Jian)性(Xing)能(Neng)、(?)质(Zhi)量(Liang)、(?)价(Jia)格(Ge)产(Chan)能(Neng)成(Cheng)为(Wei)了(Liao)主(Zhu)驱(Qu)大(Da)规(Gui)模(Mo)应(Ying)用(Yong)必(Bi)要(Yao)条(Tiao)件(Jian)。(?)
SiC为(Wei)何(He)称(Cheng)为(Wei)提(Ti)升(Sheng)新(Xin)能(Neng)源(Yuan)汽(Qi)车(Che)续(Xu)航(Hang)里(Li)程(Cheng)的(De)最(Zui)佳(Jia)方(Fang)案(An)?(?)这(Zhe)得(De)益(Yi)于(Yu)SiC MOSFET
低(Di)导(Dao)通(Tong)电(Dian)阻(Zu)、(?)低(Di)开(Kai)关(Guan)损(Sun)耗(Hao)的(De)特(Te)点(Dian),(?)新(Xin)能(Neng)源(Yuan)汽(Qi)车(Che)电(Dian)机(Ji)控(Kong)制(Zhi)器(Qi)有(You)望(Wang)实(Shi)现(Xian)70%的(De)损(Sun)耗(Hao)下(Xia)降(Jiang),(?)进(Jin)而(?)增(Zeng)加(Jia)约(Yue)5%行(Xing)驶(Shi)里(Li)程(Cheng)。(?)此(Ci)外(Wai),(?)充(Chong)电(Dian)问(Wen)题(Ti)是(Shi)影(Ying)响(Xiang)消(Xiao)费(Fei)者(Zhe)购(Gou)买(Mai)新(Xin)能(Neng)源(Yuan)车(Che)的(De)首(Shou)要(Yao)因(Yin)素(Su),(?)而(?)SiC材(Cai)料(Liao)可(Ke)以(Yi)使(Shi)得(De)单(Dan)枪(Qiang)的(De)充(Chong)电(Dian)功(Gong)率(Lu)向(Xiang)350kW以(Yi)上(Shang)发(Fa)展(Zhan),(?)通(Tong)过(Guo)高(Gao)压(Ya)快(Kuai)充(Chong)解(Jie)决(Jue)消(Xiao)费(Fei)者(Zhe)的(De)补(Bu)能(Neng)焦(Jiao)虑(Lu)。(?)
根(Gen)据(Ju)相(Xiang)关(Guan)市(Shi)场(Chang)预(Yu)测(Ce),(?)2025年(Nian)全(Quan)球(Qiu)SiC市(Shi)场(Chang)规(Gui)模(Mo)接(Jie)近(Jin)60亿(Yi)美(Mei)元(Yuan),(?)年(Nian)复(Fu)合(He)增(Zeng)长(Chang)率(Lu)预(Yu)计(Ji)为(Wei)
36.7%。(?)目(Mu)前(Qian)该(Gai)市(Shi)场(Chang)主(Zhu)要(Yao)被(Bei)国(Guo)外(Wai)企(Qi)业(Ye)垄(Long)断(Duan),(?)top厂(Chang)商(Shang)份(Fen)额(E)合(He)计(Ji)91.9%。(?)中(Zhong)国(Guo)SiC产(Chan)能(Neng)规(Gui)划(Hua)((?)衬(Chen)底(Di))(?)预(Yu)计(Ji)到(Dao)2026年(Nian)达(Da)到(Dao)468万(Wan)片(Pian)/年(Nian),(?)可(Ke)满(Man)足(Zu)3000万(Wan)辆(Liang)新(Xin)能(Neng)源(Yuan)车(Che)的(De)需(Xu)求(Qiu)。(?)詹(Zhan)旭(Xu)标(Biao)表(Biao)示(Shi),(?)中(Zhong)国(Guo)已(Yi)经(Jing)形(Xing)成(Cheng)完(Wan)善(Shan)的(De)
SiC产(Chan)业(Ye)链(Lian),(?)各(Ge)细(Xi)分(Fen)行(Xing)业(Ye)均(Jun)涌(Yong)现(Xian)出(Chu)典(Dian)型(Xing)代(Dai)表(Biao),(?)快(Kuai)速(Su)缩(Suo)小(Xiao)与(Yu)跨(Kua)国(Guo)龙(Long)头(Tou)企(Qi)业(Ye)的(De)差(Cha)距(Ju)。(?)在(Zai)技(Ji)术(Shu)距(Ju)离(Li)上(Shang),(?)国(Guo)际(Ji)SiCMOSFET技(Ji)术(Shu)发(Fa)展(Zhan)维(Wei)持(Chi)3-5年(Nian)的(De)迭(Die)代(Dai)周(Zhou)期(Qi),(?)中(Zhong)国(Guo)SiC
MOSFET器(Qi)件(Jian)最(Zui)新(Xin)技(Ji)术(Shu)目(Mu)前(Qian)已(Yi)经(Jing)对(Dui)标(Biao)国(Guo)际(Ji)主(Zhu)流(Liu)水(Shui)平(Ping),(?)并(Bing)保(Bao)持(Chi)1年(Nian)1代(Dai)的(De)节(Jie)奏(Zou)快(Kuai)速(Su)迭(Die)代(Dai)。(?)
作(Zuo)为(Wei)国(Guo)产(Chan)SiC代(Dai)表(Biao)厂(Chang)商(Shang)之(Zhi)一(Yi),(?)清(Qing)纯(Chun)半(Ban)导(Dao)体(Ti)推(Tui)出(Chu)第(Di)二(?)代(Dai)1200V SiC
MOSFET器(Qi)件(Jian),(?)核(He)心(Xin)参(Can)数(Shu)全(Quan)面(Mian)对(Dui)标(Biao)国(Guo)际(Ji)一(Yi)流(Liu)水(Shui)平(Ping),(?)包(Bao)括(Kuo)超(Chao)低(Di)导(Dao)通(Tong)电(Dian)阻(Zu)芯(Xin)片(Pian)、(?)优(You)秀(Xiu)的(De)串(Chuan)扰(Rao)抑(Yi)制(Zhi)能(Neng)力(Li)、(?)栅(Zha)极(Ji)串(Chuan)扰(Rao)电(Dian)压(Ya)、(?)动(Dong)态(Tai)损(Sun)耗(Hao)等(Deng)方(Fang)面(Mian)媲(Pi)美(Mei)国(Guo)外(Wai)同(Tong)类(Lei)产(Chan)品(Pin)。(?)目(Mu)前(Qian)已(Yi)经(Jing)通(Tong)过(Guo)AEC-Q101车(Che)规(Gui)级(Ji)可(Ke)靠(Kao)性(Xing)试(Shi)验(Yan)认(Ren)证(Zheng)。(?)清(Qing)纯(Chun)半(Ban)导(Dao)体(Ti)采(Cai)用(Yong)行(Xing)业(Ye)最(Zui)全(Quan)面(Mian)可(Ke)靠(Kao)性(Xing)测(Ce)试(Shi)方(Fang)法(Fa)、(?)最(Zui)严(Yan)苛(Ke)可(Ke)靠(Kao)性(Xing)要(Yao)求(Qiu),(?)实(Shi)现(Xian)新(Xin)能(Neng)源(Yuan)汽(Qi)车(Che)及(Ji)工(Gong)业(Ye)应(Ying)用(Yong)400万(Wan)颗(Ke)MOSFET零(Ling)失(Shi)效(Xiao)的(De)成(Cheng)就(Jiu)。(?)
SiC半(Ban)导(Dao)体(Ti)技(Ji)术(Shu)将(Jiang)围(Wei)绕(Rao)材(Cai)料(Liao)、(?)器(Qi)件(Jian)和(He)工(Gong)艺(Yi)三(San)个(Ge)方(Fang)面(Mian)迭(Die)代(Dai)发(Fa)展(Zhan),(?)包(Bao)括(Kuo)大(Da)尺(Chi)寸(Cun)低(Di)缺(Que)陷(Xian)SiC衬(Chen)底(Di)及(Ji)外(Wai)延(Yan)制(Zhi)备(Bei),(?)基(Ji)于(Yu)先(Xian)进(Jin)SiC材(Cai)料(Liao)生(Sheng)长(Chang)和(He)工(Gong)艺(Yi)技(Ji)术(Shu)的(De)新(Xin)型(Xing)SiC器(Qi)件(Jian)以(Yi)及(Ji)面(Mian)向(Xiang)下(Xia)一(Yi)代(Dai)SiC器(Qi)件(Jian)的(De)制(Zhi)造(Zao)及(Ji)封(Feng)装(Zhuang)工(Gong)艺(Yi)。(?)在(Zai)产(Chan)业(Ye)趋(Qu)势(Shi)上(Shang),(?)在(Zai)完(Wan)成(Cheng)SiC
半(Ban)导(Dao)体(Ti)技(Ji)术(Shu)创(Chuang)新(Xin)及(Ji)市(Shi)场(Chang)教(Jiao)育(Yu)后(Hou),(?)国(Guo)际(Ji)竞(Jing)争(Zheng)焦(Jiao)点(Dian)逐(Zhu)步(Bu)从(Cong)技(Ji)术(Shu)研(Yan)发(Fa)转(Zhuan)移(Yi)到(Dao)大(Da)规(Gui)模(Mo)量(Liang)产(Chan),(?)而(?)依(Yi)托(Tuo)巨(Ju)大(Da)的(De)应(Ying)用(Yong)市(Shi)场(Chang)和(He)高(Gao)效(Xiao)产(Chan)能(Neng)提(Ti)升(Sheng),(?)中(Zhong)国(Guo)有(You)望(Wang)主(Zhu)导(Dao)全(Quan)球(Qiu)SiC半(Ban)导(Dao)体(Ti)产(Chan)业(Ye)。(?)